ISO 23170:2022

International Standard   Current Edition · Approved on 15 June 2022

Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

ISO 23170:2022 Files

English 29 Pages
Current Edition
71.13 BHD

ISO 23170:2022 Scope

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

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