ISO 23170:2022
International Standard
Current Edition
·
Approved on
15 June 2022
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
ISO 23170:2022 Files
English
29 Pages
Current Edition
69.9 BHD
ISO 23170:2022 Scope
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).
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